4、NF3具有相對短的大氣壽命（740年），比C2F6和CF4.更容易分解。HF最終擴散到大氣中，在大氣中它通過溼沉積被除去。
1、Study on the Improvement of Ashing Rate of Photoresist Ashing Process with CF4 Gas;
3、NF3 has a relatively short atmospheric lifetime (740 years) and dissociates more readily than C2F6 and CF4. HF ultimately diffuses down to the troposphere where it is removed by wet deposition.
2、The optical emission spectrum of r. f. plasma during amorphous silicon based film etching in CF4 gas is detected.
