In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate.
Characteristics of HfO_xN_y thin films by rf reactive sputtering at different deposition temperatures
Investigation of mechanical properties of ZrCN thin films fabricated by DC magnetron reactive sputtering
Effect of Technological parameters on deposition rate of ZAO films prepared by DC magnetron reactive sputtering
